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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Examination of several novel approaches for the measurement of two-dimensional roughness of sidewalls of high-aspect-ratio patterns using the atomic force microscope
Kingsley, Jeffrey R., Plano, Robert J., Chao, Kuo-Jen, Singh, BhanwarVolume:
3332
Year:
1998
Language:
english
DOI:
10.1117/12.308761
File:
PDF, 4.25 MB
english, 1998