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SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Implementation of chemically amplified resist on mask technology below 0.6-μm feature using high-acceleration voltage e-beam system
Lee, Il-Ho, Nam, Kyung-Han, Yeon, Kyeong-Mee, Park, Keuntaek, Koo, Sang-Sool, Koo, Youngmo, Baik, Ki-Ho, Morimoto, HiroakiVolume:
3748
Year:
1999
Language:
english
DOI:
10.1117/12.360240
File:
PDF, 2.08 MB
english, 1999