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SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Effects of mask error factor on process window capability
Schurz, Dan L., Flack, Warren W., Cohen, Simon J., Newman, Thomas H., Nguyen, Khiem T., Abboud, Frank E., Grenon, Brian J.Volume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373317
File:
PDF, 638 KB
english, 1999