SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - New architecture for laser pattern generators for 130 nm and beyond
Ljungblad, Ulric B., Sandstrom, Torbjoern, Buhre, Hans, Duerr, Peter, Lakner, Hubert K., Grenon, Brian J., Dao, Giang T.Volume:
4186
Year:
2001
Language:
english
DOI:
10.1117/12.410691
File:
PDF, 469 KB
english, 2001