SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Designing photoresist systems for CO2-based microlithography
Flowers, Devin, Hoggan, Erik N., Carbonell, Ruben G., DeSimone, Joseph M., Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474240
File:
PDF, 47 KB
english, 2002