SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems
van Ingen Schenau, Koen, Bakker, Hans, Zellenrath, Mark, Moerman, Richard, Linders, Jeroen, Rohe, Thomas, Emer, Wolfgang, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474612
File:
PDF, 1.59 MB
english, 2002