![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Dose and focus estimation using top-down SEM images
Shishido, Chie, Nakagaki, Ryo, Tanaka, Maki, Takagi, Yuji, Morokuma, Hidetoshi, Komuro, Osamu, Mori, Hiroyoshi, Herr, Daniel J.Volume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.483673
File:
PDF, 969 KB
english, 2003