SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Methods to achieve sub-100-nm contact hole lithography
Lindsay, Tracy K., Kavanagh, Robert J., Pohlers, Gerd, Kanno, Takafumi, Bae, Young C., Barclay, George G., Kanagasabapathy, Subbareddy, Mattia, Joseph, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485173
File:
PDF, 891 KB
english, 2003