SPIE Proceedings [SPIE SPIE 31st International Symposium on...

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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Reflow modeling for elongated contact hole shape

Lee, Ji-Eun, Lin, Qinghuang, Kim, Dai-Gyoung, Kim, Kang Baek, Jung, Mi-Rim, Kang, Hye-Young, Kim, Jong-Sun, Hong, Joo-Yoo, Oh, Hye-Keun, Park, Jun-Tack
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Volume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.656286
File:
PDF, 316 KB
english, 2006
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