SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Characterization of photo-acid redeposition in 193-nm photoresists
Wallow, Thomas, Lin, Qinghuang, Plat, Marina, Zhang, Zhanping, MacDonald, Brian, Bernard, Joffre, Romero, Jeremias, La Fontaine, Bruno, Levinson, Harry J.Volume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.712338
File:
PDF, 910 KB
english, 2007