SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA...

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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Characterization of photo-acid redeposition in 193-nm photoresists

Wallow, Thomas, Lin, Qinghuang, Plat, Marina, Zhang, Zhanping, MacDonald, Brian, Bernard, Joffre, Romero, Jeremias, La Fontaine, Bruno, Levinson, Harry J.
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Volume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.712338
File:
PDF, 910 KB
english, 2007
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