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SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Development and characterization of a new low stress molybdenum silicide film for 45 nm attenuated phase shift mask manufacturing
Faure, Thomas, Naber, Robert J., Kawahira, Hiroichi, Gallagher, Emily E., Kindt, Louis, Nash, Steven, Racette, Ken, Wistrom, Richard, Komizo, Toru, Kikuchi, Yasutaka, Nemoto, Satoru, Sasaki, Yushin, KVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.748664
File:
PDF, 1.08 MB
english, 2007