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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Industrial characterization of scatterometry for advanced APC of 65 nm CMOS logic gate patterning
Dabertrand, Karen, Allgair, John A., Raymond, Christopher J., Touchet, Mathieu, Kremer, Stephanie, Chaton, Catherine, Gatefait, Maxime, Aparicio, Enrique, Polli, Marco, Royer, Jean-ClaudeVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.771614
File:
PDF, 294 KB
english, 2008