Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor
Li, D., Goullet, A., Carette, M., Granier, A., Zhang, Y., Landesman, J.P.Volume:
131
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2016.07.004
Date:
September, 2016
File:
PDF, 1.40 MB
english, 2016