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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - A chemical underlayer approach to mitigate shot noise in EUV contact hole patterning
Wallow, Thomas I., Hohle, Christoph K., Li, Jin, Yasuaki, Ide, Nakasugi, Shigemasa, Misumi, Motoki, Yanagita, Hiroshi, Suzuki, Fumihiro, Pawlowski, Georg, Cho, JoonYeon, Yao, Huirong, Kudo, Takanori,Volume:
9051
Year:
2014
Language:
english
DOI:
10.1117/12.2046237
File:
PDF, 860 KB
english, 2014