SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Dry etching resistance of resist base polymer and its improvement
Kishimura, Shinji, Kimura, Yoshika, Sakai, Junjiro, Tsujita, Kouichirou, Matsui, Yasuji, Tarascon-Auriol, Regine G.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275894
File:
PDF, 1.54 MB
english, 1997