SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - New variable-transmission illumination technique optimized with design rule criteria
Cirelli, Raymond A., Mkrtchyan, Masis M., Watson, Pat G., Trimble, Lee E., Weber, Gary R., Windt, David L., Nalamasu, Omkaram, Van den Hove, LucVolume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310739
File:
PDF, 2.49 MB
english, 1998