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SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - Remote plasma nitrided oxides for ultrathin gate dielectric applications
Hattangady, Sunil, Grider, D. T., Kraft, Robert, Shiau, Wei-Tsun, Douglas, Monte A., Nicollian, P., Rodder, Mark, Brown, George A., Chatterjee, Amitava, Hu, Jerry C., Aur, S., Tsai, H.-L., Chapman, R.Volume:
3506
Year:
1998
Language:
english
DOI:
10.1117/12.323956
File:
PDF, 954 KB
english, 1998