SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Temperature rising effect of 193-nm chemically amplified resist during postexposure bake
Lee, Young-Mi, Sung, Moon-Gyu, Lee, Eun-Mi, Sohn, Young-Soo, Bak, Heungin, Oh, Hye-Keun, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388263
File:
PDF, 456 KB
english, 2000