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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Techniques to print sub-0.2-μm contact holes
Aramaki, Kayo, Hamada, T., Lee, DongKwan, Okazaki, Hiroshi, Tsugama, Naoko, Pawlowski, Georg, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388360
File:
PDF, 1.92 MB
english, 2000