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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - High-resolution proximity printing by wave-optically designed masks
Nellissen, Ton J., Wang, Lingli, Dirkzwager, Maarten, Wyrowski, Frank, Kley, Ernst-Bernhard, Aagendahl, Harald, Buehling, Sven, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436663
File:
PDF, 1.25 MB
english, 2001