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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Line-edge roughness in positive-tone chemically amplified resists: effect of additives and processing conditions
Lin, Qinghuang, Goldfarb, Dario L., Angelopoulos, Marie, Sriram, Suresh R., Moore, Jeffrey S., Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436836
File:
PDF, 578 KB
english, 2001