SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Accuracy of simulation based on the acid-quencher mutual diffusion model in KrF processes
Hattori, Keiko T., Abe, Jun, Fukuda, Hiroshi, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474505
File:
PDF, 900 KB
english, 2002