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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Modification of boundaries conditions in the FDTD algorithm for EUV mask modeling
Vial, Alexandre, Erdmann, Andreas, Schmoeller, Thomas, Kalus, Christian K., Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476992
File:
PDF, 211 KB
english, 2002