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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Simulation-based scattering bar generation for 65-nm and beyond
Hung, Chi-Yuan, Weed, J. Tracy, Martin, Patrick M., Liu, Qingwei, Zhang, LiguoVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.629798
File:
PDF, 152 KB
english, 2005