SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Data Analysis and Modeling for Process Control III - Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
Tay, Arthur, Emami, Iraj, Tobin, Jr., Kenneth W., Ho, Weng-Khuen, Hu, Ni, Tsai, Kuen-Yu, Zhou, YingVolume:
6155
Year:
2006
Language:
english
DOI:
10.1117/12.654741
File:
PDF, 745 KB
english, 2006