SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Outlook for potential third-generation immersion fluids
López-Gejo, Juan, Lin, Qinghuang, Kunjappu, Joy T., Zhou, J., Smith, B. W., Zimmerman, Paul, Conley, Will, Turro, Nicholas J.Volume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.695536
File:
PDF, 460 KB
english, 2007