SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Resolution enhancement technique using oxidation process with nitride hardmask process
Jeong, Eunsoo, Archie, Chas N., Kim, Jaehee, Kim, Keeho, Kim, Daeyoung, Lim, HyunjuVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.712017
File:
PDF, 618 KB
english, 2007