SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - The art of photomask materials for low-k1-193nm lithography
Hashimoto, Masahiro, Hosono, Kunihiro, Iwashita, Hiroyuki, Mitsui, HideakiVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.830600
File:
PDF, 799 KB
english, 2009