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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Actinic phase defect detection and printability analysis for patterned EUVL mask
La Fontaine, Bruno M., Terasawa, Tsuneo, Yamane, Takeshi, Tanaka, Toshihiko, Suga, Osamu, Kamo, Takashi, Mori, IchiroVolume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846678
File:
PDF, 2.52 MB
english, 2010