SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Assessing EUV mask defectivity
La Fontaine, Bruno M., Okoroanyanwu, Uzodinma, Tchikoulaeva, Anna, Ackmann, Paul, Wood, Obert, La Fontaine, Bruno, Bubke, Karsten, Holfeld, Christian, Peters, Jan Hendrik, Kini, Sumanth, Watson, SterlVolume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.847348
File:
PDF, 1.05 MB
english, 2010