SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Evaluation of 25-nm pitch SiO 2 /Si multilayer grating reference using CD-SEM
Kawada, Hiroki, Raymond, Christopher J., Nakayama, Yoshinori, Yamamoto, JiroVolume:
7638
Year:
2010
Language:
english
DOI:
10.1117/12.848308
File:
PDF, 982 KB
english, 2010