SPIE Proceedings [SPIE SPIE OPTO - San Francisco, California, USA (Saturday 21 January 2012)] High Contrast Metastructures - Fabrication and characterization of Si/SiO2 high contrast grating using nanoimprint lithography
Hashizume, Yuuki, Miyake, Yasumitsu, Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio, Chang-Hasnain, Connie J., Koyama, Fumio, Willner, Alan E., Zhou, WeiminVolume:
8270
Year:
2012
Language:
english
DOI:
10.1117/12.910865
File:
PDF, 1.85 MB
english, 2012