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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Precise x-ray mask writing technology using advanced 100-kV EB writer EB-X3
Nakayama, Yoshinori, Watanabe, Hiroshi, Tsuboi, Shinji, Aoyama, Hajime, Ezaki, Mizunori, Matsui, Yasuji, Morosawa, Tetsuo, Oda, Masatoshi, Kawahira, HiroichiVolume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438364
File:
PDF, 1.62 MB
english, 2001