SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Efficient optimization of lithographic process conditions using a distributed combined global/local search approach
Fühner, Tim, Flagello, Donis G., Popp, Stephan, Dürr, Christoph, Erdmann, AndreasVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656197
File:
PDF, 630 KB
english, 2006