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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Performance of a dry 193nm resist under wet conditions
Padmanaban, Munirathna, Lin, Qinghuang, Romano, Andrew, Lin, Guanyang, Chiu, Simon, Timko, Allen, Houlihan, Frank, Rahman, Dalil, Chakrapani, S., Kudo, T., Dammel, Ralph R., Turnquest, Karen, Rich, GeVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.659392
File:
PDF, 729 KB
english, 2006