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Effects of ambient gases on the formation of SiOxNyfilms by KrF laser ablation of Si3N4target with a shadow mask
K. Maruyama, Y. Aoki, Y. Hiroshima, H. OhtaVolume:
15
Language:
english
Pages:
4
DOI:
10.1007/bf00241152
Date:
December, 1996
File:
PDF, 918 KB
english, 1996