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SPIE Proceedings [SPIE Optical Science and Technology, SPIE's 48th Annual Meeting - San Diego, California, USA (Sunday 3 August 2003)] Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications - Development of Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography
Khounsary, Ali M., Murakami, Katsuhiko, Shiraishi, Masayuki, Dinger, Udo, Ota, KazuyaVolume:
5193
Year:
2003
Language:
english
DOI:
10.1117/12.508116
File:
PDF, 600 KB
english, 2003