SPIE Proceedings [SPIE Optics East - Philadelphia, PA (Monday 25 October 2004)] Nanofabrication: Technologies, Devices, and Applications - Self-alignment method by buried mask implantation for double gate MOS and nanodevices fabrication
Charavel, Remy, Lai, Warren Y., Pau, Stanley, Raskin, Jean-Pierre, Lopez, O. DanielVolume:
5592
Year:
2004
Language:
english
DOI:
10.1117/12.572660
File:
PDF, 346 KB
english, 2004