SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Die-to-database verification tool for detecting CD errors, which are caused by OPC features, by using mass gate measurement and layout information
Kitamura, Tadashi, Archie, Chas N., Hasebe, Toshiaki, Kubota, Kazufumi, Sakai, Futoshi, Nakazawa, Shinichi, Lin, David, Hoffman, Michael J., Yamamoto, Masahiro, Inoue, MasahiroVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.712413
File:
PDF, 1.66 MB
english, 2007