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Highly sensitive self developing electron-beam resist of aldehyde copolymer
Koichi Hatada, Tatsuki Kitayama, Shigeru Danjo, Heimei Yuki, Hiroaki Aritome, Susumu Namba, Kazuo Nate, Hitoshi YokonoVolume:
8
Language:
english
Pages:
4
DOI:
10.1007/bf00265269
Date:
November, 1982
File:
PDF, 201 KB
english, 1982