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SPIE Proceedings [SPIE Photomask Japan '97 - Kawasaki City, Japan (Thursday 17 April 1997)] Photomask and X-Ray Mask Technology IV - Mask bias effects in e-beam cell projection lithography
Ema, Takahiro, Yamashita, Hiroshi, Nakajima, Ken, Nozue, Hiroshi, Aizaki, NaoakiVolume:
3096
Year:
1997
Language:
english
DOI:
10.1117/12.277276
File:
PDF, 350 KB
english, 1997