SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - New method of correlating product wafer yield to alignment performance and an optimized accounting method for product wafer alignment
Zhou, Hao, Singh, BhanwarVolume:
3332
Year:
1998
Language:
english
DOI:
10.1117/12.308726
File:
PDF, 872 KB
english, 1998