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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - New development of cost-effective sub-0.18-μm lithography with i-line
Chung, Hoesik, Jung, Jinhang, Kim, Youngsun, Choi, KwangSoek, Yoo, NamHee, Yoon, Sangwoong, Park, JeEung, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388334
File:
PDF, 1.31 MB
english, 2000