![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Double-shielded objective lens system for electron-beam lithography system
Ohta, Hiroya, Someda, Yasuhiro, Sohda, Yasunari, Saitou, Norio, Katoh, Shin-ichi, Itoh, Hiroyuki, Dobisz, Elizabeth A.Volume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390106
File:
PDF, 541 KB
english, 2000