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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - SCAA mask exposures and Phase Phirst designs for 100 nm and below
Levenson, Marc D., Ebihara, Takeaki, Yamachika, Mikio, Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435709
File:
PDF, 943 KB
english, 2001