SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Modification of development parameters of 193-nm chemically amplified resist with pattern density
Seo, Eun-Jung, Sohn, Young-Soo, Bak, Heungin, Oh, Hye-Keun, Woo, Sang-Gyun, Seong, Nakgeuon, Cho, Hanku, Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436821
File:
PDF, 283 KB
english, 2001