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SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Resist parameter extraction with graphical user interface in X
Chiu, Anita S., Ferguson, Richard A., Doi, Takeshi, Wong, Alfred K. K., Tam, Nelson, Neureuther, Andrew R., Ito, HiroshiVolume:
1466
Year:
1991
Language:
english
DOI:
10.1117/12.46412
File:
PDF, 841 KB
english, 1991