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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)
Loeschner, Hans, Stengl, Gerhard, Buschbeck, Herbert, Chalupka, A., Lammer, Gertraud, Platzgummer, Elmar, Vonach, Herbert, de Jager, Patrick W., Kaesmaier, Rainer, Ehrmann, Albrecht, Hirscher, Stefan,Volume:
4688
Year:
2002
Language:
english
DOI:
10.1117/12.472336
File:
PDF, 1.60 MB
english, 2002