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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Optimization of organic bottom antireflective coatings' compatibility with ArF resists
Xiang, Zhong, Shan, Jianhui, Gonzalez, Eleazar, Wu, Hengpeng, Ding, Shuji, Neisser, Mark, Ho, Bang-Chein, Chen, Harrison, Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474186
File:
PDF, 728 KB
english, 2002