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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Investigation of phase variation impact on CPL PSM for low k1 imaging
Lin, Chun-hung, Tanabe, Hiroyoshi, Hsu, Michael, Hsieh, Frank, Lin, Shu Yi, Hsu, Stephen D., Shi, Xuelong, Van Den Broeke, Douglas J., Chen, J. Fung, Tang, F. C., Hsieh, W. A., Huang, C. Y.Volume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504176
File:
PDF, 773 KB
english, 2003